Tools
MOCVD1
The MOCVD1 system is a cold-wall, 2-inch wafer MOCVD reactor (SiC-coated susceptor) up to 1000 °C, water-cooled, with wafer rotation for uniformity. It features a nitrogen-purged glovebox, gas panel, LabView control, six bubblers, H2Se/H2S lines, H2/N2 process gases, 10–700 Torr, exhaust scrubber, and a 16-point chemcassette monitor with interlock.
MOCVD2
MOCVD2 is a custom designed multi-module system from CVD Equipment Corporation. The system includes a load lock and high vacuum robotic transfer stage with three additional ports. A stainless-steel chamber for metalorganic chemical vapor deposition (MOCVD) of chalcogenides is connected to one of the ports. The chamber consists of temperature-controlled wall
Muffle Furnace
The 2DCC operates five 1200°C Muffle Furnaces for melt growth, flux growth, and solid-state reactions. One furnace is inside a fume hood for toxic elements (e.g., lead, arsenic). Each furnace accepts ampoules up to 15 cm (or multiple shorter ones) and offers programmable, multi-segment ramp/dwell profiles.
New Chet
High-pressure thermal evaporation system for confinement heteroepitaxy (CHet) of 2D metals and alloys. Substrates 5–100 mm, heated to 1000°C, with 1–30 RPM rotation. Evacuation by turbo pumps to <5×10^-7 Torr; pressure up to 20 Torr with closed-loop control. Three evaporation sources; ion/plasma aids graphene. Gases: N2, Ar, Ar/H2, O2.
RMN3
Glovebox-mounted Witec Apyron Alpha 300R confocal microscope enables Raman and photoluminescence measurements. Fully automated for laser switching (532/633 nm), gratings (300/600/1800 l/mm), objectives (x5/x10/x50/x100), focus, and XY stage. Detectors resolve 10 cm^-1 (532 nm) and 0.1 cm^-1 (632 nm). Includes Linkam LTSE cryostage (-196 to 200°C) with four tungsten probes.
Rocking Compounding Furnace
The 2DCC compounding furnace is a single-zone unit reaching up to 1250 °C, used to mix source powders for later crystal growth in Vertical Bridgman or chemical vapor transport furnaces. It accommodates ampoules up to 2 inches in diameter (or multiple smaller) and tilts during mixing to improve uniformity.
SICG (Francesca)
An in-house graphite hot-zone furnace for epitaxial graphene, heating up to ~2500 °C, with a 4×6 inch work zone for 5 mm to 4" wafers in custom crucibles. Vacuum to 10−6 Torr (rotary vane and diffusion pumps). Ar carrier gas and H2/CH4 precursors; 1–1000 Torr operating pressure.
STM1
Nanoprobe STM with 4 independent tips enables 4-point electrical transport to 4.5 K. An integrated SEM positions tips over sample features with <1 μm resolution. Each tip can perform STM, but only one at a time. A coil provides up to 200 gauss field. Argon sputtering cleans tips and samples.
Vertical Bridgman
The 2DCC Vertical Bridgman Bulk Growth System is a three-zone furnace (max 1250 °C) whose bore accommodates a 2-inch-diameter ampoule or multiple smaller ones. It offers programmatic control for linear translation, ampoule rotation, and data logging of growth conditions.
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